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CVD system
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The thin membrane forming system mainly of the
laser CVD system meets the demand from the wide range of fields.
In addition, all sorts of vacuum deposition and sputtering system
are provided by using the high vacuum technology. |
Laser abrasive CVD system |
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| r-210 |
|
| The continuous deposition of
the multiphase ceramics such as Al2O3 and PZT which minimizes
the collapse of relative proportion of component by irradiating
the optical energy of laser has become capable. |
|
Diamond deposition system |
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| cb-1020 |
|
| In order to optimize the plasma density and
temperature control which would be the factors of diamond
deposition, various measures are taken including the work
cooling mechanism and the work positioning mechanism for plasma.
|
|
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| AL-8000 |
|
| It is an atomic layer deposition system capable
of processing single wafer through the batch process by adopting
switching mechanism for original material gas flow. By setting
the system composition as cluster type, the high throughput
enables to cope even with the process that tends to take longer
time for processing. |
|
Electron beam vacuum deposition system |
 |
| HV-500 |
|
| The electron beam vacuum deposition
that restricts oxidizing material at the ultrahigh vacuum
is available. The substrate is supplied without breaking the
high vacuum through the load lock room, which facilitates
its continuous use. |
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