HOME „ CVD system
Japanese

CVD system


The thin membrane forming system mainly of the laser CVD system meets the demand from the wide range of fields.
In addition, all sorts of vacuum deposition and sputtering system are provided by using the high vacuum technology.

Laser abrasive CVD system

‚r-210
The continuous deposition of the multiphase ceramics such as Al2O3 and PZT which minimizes the collapse of relative proportion of component by irradiating the optical energy of laser has become capable.

Diamond deposition system

‚c‚b-1020
In order to optimize the plasma density and temperature control which would be the factors of diamond deposition, various measures are taken including the work cooling mechanism and the work positioning mechanism for plasma.

ALD system

AL-8000
It is an atomic layer deposition system capable of processing single wafer through the batch process by adopting switching mechanism for original material gas flow. By setting the system composition as cluster type, the high throughput enables to cope even with the process that tends to take longer time for processing.

Electron beam vacuum deposition system

HV-500
The electron beam vacuum deposition that restricts oxidizing material at the ultrahigh vacuum is available. The substrate is supplied without breaking the high vacuum through the load lock room, which facilitates its continuous use.
@
‹๓”’
Heat treatment System
–๎ˆ๓ Ohmic Alloy System
–๎ˆ๓ Batch-processing wafer annealing system
–๎ˆ๓ Vertical-type diffusion system
WET System
Contamination extraction system
Single wafer dual-side cleaning system
Single wafer lift-off system
RCA wet- and UV cleaning / complex system

CVD System
Laser abrasive CVD system
Diamond deposition system
ALD system
Electron beam vacuum deposition system

Etching System
Fully-automated etching system
Multipurpose etching & ashing system
Dry etching system for compound semiconductors
Multi-electrode dry etching system

UV optical application system
Electrodeless high-power UV opto-irradiation system
Desktop-type deep UV surface cleaning system
UV ashing system
Hard disk surface cleaning system

MEMS related system
KOH anisotropic etching system
Anodic bonding system for micro-machine

Inspection & measurement system
Atmospheric ion counter
Counter for particle in the liquid

Bio analyzing system
Microchip electrophoresis system

Special system & consignment development system
Small-size high-voltage generating system
Multifunctional etching system
Back-side etching system
Atmospheric-pressure plasma system for MEMS

@
Copyright (c) 2007 Chemitronics Co., Ltd. All rights reserved