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Research and Development, Demonstration

Experiment facilities in which directions of the next generation processes are sought in order to meet various needs. ＜CTT＞
In addition to performance evaluation tests on your self-developed products, orders for customized processes and research sample preparation will be accepted.

Laboratory Layout


ANNEALING & DOPING WET PROCESS PHOTO & LITHO PROCESS
Ohmic Alloy SystemVertical-type diffusion system for compound semiconductorsOxidation furnace Ultra-precision wet etching system
Ozone water etching system
Lift-off systemFume hoods for inorganic solvent
Fume hoods for organic solvent		 Spin coater
Double side mask aligner
Exposure system

UTILITY CVD & THIN FILM DRY ETCHING PROCESS
Water purifying apparatus
Scrubber
Water scrubber

Low-pressure plasma CVD system
Atmospheric pressure plasma CVD system
Laser CVD system
MOCVD system
CVD system（12"）
CVD system（6"）
Deposition apparatus
EB deposition apparatus
Ternary sputtering system
Ti sputtering system

 Dry etching system（12"）
Dry etching system（8"）
Dry etching system（4"）
DeepRIE system
Sacrifice layer dry etching system
Compact etcherIon milling system
Laser beam machine

OBSERVATION　&　MEASUREMENT
FTIR
SEM（+EDX）
Depth measuring microscope system
Non-contract step-height meter
Non-contact film thickness meter
Step-height measuring instrument
Interference metallographic microscope
Stereoscopic microscope
Prober

　
■The Group
Technofront Co., Inc.
Technofine Co., Ltd.
BioCMOS Co., Ltd.

■Laboratory
Laboratory
　
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